C08G 2261/594
Against light, i.e. electromagnetic radiation
Official title: against light, i.e. electromagnetic radiation
C08G2261/594 (Against light, i.e. electromagnetic radiation) appears on 6 US grants and 9 published applications in this corpus.
Search patents in C08G- Granted patents
- 6
- Published applications
- 9
- Assignees
- 9
- Inventors
- 23
- Latest grant
- 31 Dec 2024
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2012 | 0 | 1 |
| 2013 | 0 | 1 |
| 2014 | 1 | 1 |
| 2015 | 0 | 0 |
| 2016 | 0 | 1 |
| 2017 | 2 | 0 |
| 2018 | 0 | 0 |
| 2019 | 0 | 1 |
| 2020 | 0 | 0 |
| 2021 | 1 | 1 |
| 2022 | 0 | 1 |
| 2023 | 0 | 1 |
| 2024 | 2 | 1 |
By publication year.
Recent patents
- Oligomeric materials for UV blocking applications and methods thereof31 Dec 2024US 12,180,150 B2Agency for Science, Technology and Research
- In situ polymerization of para-xylene for production of parylene F-like coating26 Mar 2024US 11,938,512 B2
- Compositions useful for the formation of an antistatic layer or an electromagnetic radiation shield3 Aug 2021US 11,078,326 B2Heraeus Deutschland GmbH & Co. KG
- UV-active chromophore functionalized polysiloxanes and copolymers made therefrom7 Feb 2017US 9,562,159 B2Momentive Performance Material Inc.
- Organic semiconductor device and process for its production10 Jan 2017US 9,543,521 B2BASF SE
- In situ polymerization of para-xylene for production of parylene f-like coating4 Jul 2024US 2024/0216948 A1HZO, Inc.
- Resin composition27 Jul 2023US 2023/0235117 A1Mitsubishi Gas Chemical Company, Inc.
- Oligomeric Materials for UV Blocking Applications and Methods Thereof16 Jun 2022US 2022/0185758 A1Agency for Science, Technology and Research
- In situ polymerization of para-xylene for production of parylene f-like coating6 May 2021US 2021/0129180 A1HZO, Inc.
- Compositions useful for the formation of an antistatic layer or an electromagnetic radiation shield12 Dec 2019US 2019/0375888 A1Heraeus Deutschland GmbH & Co. KG
Most cited
By later US patents