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US 2024/0216948 A1Published application
In situ polymerization of para-xylene for production of parylene f-like coating
AssigneeHZO, Inc.
InventorsJohn Janik, Sean Clancy, Benjamin Lawrence
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Abstract
A method for depositing coating onto a substrate includes providing a monomer for creation of a protective coating on a substrate, energizing the monomer with a plasma generation system, and polymerizing the energized monomer onto the substrate in a plasma-enhanced chemical vapor deposition (PECVD) chamber.
Claims20
A method for depositing coating onto a substrate, comprising:
- providing a monomer for creation of a protective coating on a substrate;
- energizing the monomer with a plasma generation system;
- and
- polymerizing the energized monomer onto the substrate in a plasma-enhanced chemical vapor deposition (PECVD) chamber.
1 more element
A coating system comprising:
- a plasma-enhanced chemical vapor deposition (PECVD) chamber;
- a plasma generation system coupled with the PECVD chamber;
- and
- a precursor source, the precursor source comprising a monomer, the monomer configured to polymerize into a coating.
1 more element
Dependencies are inferred from the claim text.