C07C 309/54
At least one of the nitrogen atoms being part of any of
Official title: at least one of the nitrogen atoms being part of any of the groups [IMAGE cpc-sch-C07C-0976.gif], X being a hetero atom, Y being any atom
C07C309/54 (At least one of the nitrogen atoms being part of any of) appears on 5 US grants and 3 published applications in this corpus.
Search patents in C07C- Granted patents
- 5
- Published applications
- 3
- Assignees
- 4
- Inventors
- 11
- Latest grant
- 7 Apr 2020
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1979 | 1 | 0 |
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
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| 1990 | 0 | 0 |
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| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
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| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 1 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 0 |
| 2012 | 0 | 0 |
| 2013 | 0 | 0 |
| 2014 | 0 | 0 |
| 2015 | 0 | 0 |
| 2016 | 0 | 0 |
| 2017 | 0 | 0 |
| 2018 | 0 | 2 |
| 2019 | 0 | 0 |
| 2020 | 2 | 0 |
| 2021 | 0 | 0 |
| 2022 | 0 | 0 |
| 2023 | 0 | 1 |
By publication year. Applications have been published since 2001.
Subgroups
Granted patents
Recent patents
- Resist composition and patterning process7 Apr 2020US 10,613,436 B2Shin-Etsu Chemical Co., Ltd.
- Resist composition and patterning process7 Apr 2020US 10,613,437 B2Shin-Etsu Chemical Co., Ltd.
- Iodide ion releasing compound, and silver halide light-sensitive photographic material containing the same15 May 2001US 6,232,057 B1Konica Corporation
- Compounds containing hydroxyl groups and urethano-aryl-sulfonic acid groups23 Sep 1980US 4,224,418 ABayer Aktiengesellschaft
- Compounds containing hydroxyl groups and urethano-aryl-sulfonic acid groups13 Nov 1979US 4,174,434 ABayer Aktiengesellschaft
- Depalmitoylating compositions and the use thereof13 Apr 2023US 2023/0114304 A1The Regents of the University of California
- Resist composition and patterning process27 Sep 2018US 2018/0275512 A1Shin-Etsu Chemical Co., Ltd.
- Resist composition and patterning process20 Sep 2018US 2018/0267402 A1Shin-Etsu Chemical Co., Ltd.
Most cited
By later US patents
- Compounds containing hydroxyl groups and urethano-aryl-sulfonic acid groups8US 4,224,418 ABayer Aktiengesellschaft · 1980
- Resist composition and patterning process6US 10,613,437 B2Shin-Etsu Chemical Co., Ltd. · 2020
- Compounds containing hydroxyl groups and urethano-aryl-sulfonic acid groups4US 4,174,434 ABayer Aktiengesellschaft · 1979
- Resist composition and patterning process3US 10,613,436 B2Shin-Etsu Chemical Co., Ltd. · 2020