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  2. /C · Chemistry
  3. /C01 · Inorganic chemistry
  4. /C01B · Non-metallic elements
  5. /C01B 21/00 · Nitrogen
  6. /C01B 21/082 · Compounds containing nitrogen and non-metals and optionally metals
  7. /C01B 21/083 · Containing one or more halogen atoms
  8. /C01B 21/084 · Containing also one or more oxygen atoms
  9. /C01B 21/0842 · Halides of nitrogen oxides
  10. /C01B 21/0844
C01B 21/0844

Nitrosyl fluoride

Official title: {Nitrosyl fluoride}

C01B21/0844 (Nitrosyl fluoride) appears on 1 US grants and 5 published applications in this corpus.

Search patents in C01B

Where it sits

  1. CChemistry
  2. C01Inorganic chemistry
  3. C01BNon-metallic elements
  4. C01B 21/00Nitrogen
  5. C01B 21/082Compounds containing nitrogen and non-metals and optionally metals
  6. C01B 21/083Containing one or more halogen atoms
  7. C01B 21/084Containing also one or more oxygen atoms
  8. C01B 21/0842Halides of nitrogen oxides
  9. C01B 21/0844Nitrosyl fluoride
Granted patents
1
Published applications
5
Assignees
3
Inventors
7
Latest grant
1 Oct 2024

Filings by year

Granted patentsPublished applications
C01B 21/0844: granted patents and published applications per publication year
YearGranted patentsPublished applications
202001
202100
202201
202300
202411
202502

202020212022202320242025

By publication year.

Recent patents

  • Systems and methods for storage and supply of F3NO-free FNO gases and F3NO-free FNO gas mixtures for semiconductor processes1 Oct 2024US 12,106,940 B2L Air Liquide, Societe Anonyme Pour L'Etude et L'Exploitation des Procedes Georges Claude
  • Method for storing fluorine-containing nitrogen compound24 Jul 2025US 2025/0237354 A1Resonac Corporation
  • Method for storing fluorine-containing nitrogen compound10 Jul 2025US 2025/0223164 A1Resonac Corporation
  • Etching gas and etching method9 May 2024US 2024/0153778 A1Resonac Corporation
  • Systems and methods for storage and supply of f3no-free fno gases and f3no-free fno gas mixtures for semiconductor processes30 Jun 2022US 2022/0208517 A1L Air Liquide, Societe Anonyme Pour L'Etude et L'Exploitation des Procedes Georges Claude
  • Systems and methods for storage and supply of f3no-free fno gases and f3no-free fno gas mixtures for semiconductor processes25 Jun 2020US 2020/0203127 A1L' Air Liquide, Societe Anonyme pour I' Etude et I'Exploitation des Procedes Georges Claude

Most cited

By later US patents

No patent in this class has been cited by a later US patent yet.

Top assignees

Documents
  • RResonac Corporation3
  • LAL Air Liquide, Societe Anonyme Pour L'Etude et L'Exploitation des Procedes Georges Claude2
  • LAL' Air Liquide, Societe Anonyme pour I' Etude et I'Exploitation des Procedes Georges Claude1

Often classified with

  • C09KMaterials for miscellaneous applications, not provided for elsewhere4
  • H10PGeneric processes or apparatus for the manufacture or treatment of devices covered4
  • C01PIndexing scheme relating to structural and physical aspects of solid inorganic compounds3
  • H01JElectric discharge tubes or discharge lamps3
  • F17CVessels for containing or storing compressed, liquefied or solidified gases2

Documents that also carry the other class.

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