Systems and methods for storage and supply of F3NO-free FNO gases and F3NO-free FNO gas mixtures for semiconductor processes

A method for storage and supply of a F3NO-free FNO-containing gas, the method comprising the steps of:

• storing the F3NO-free FNO-containing gas in a NiP coated steel cylinder with a polished inner surface;
• adding additional F2 to the F3NO-free FNO-containing gas to suppress the formation of F3NO in the F3NO-free FNO-containing gas;
• passivating a manifold assembly with FNO;
• releasing the F3NO-free FNO-containing gas from the cylinder to the manifold assembly by activating a cylinder valve in fluid communication with the cylinder and the manifold assembly;
• de-pressurizing the F3NO-free FNO-containing gas by activating a pressure regulator in the manifold assembly so as to divide the manifold assembly into a first pressure zone upstream of the pressure regulator and a second pressure zone downstream of the pressure regulator;
• and
• feeding the de-pressurized F3NO-free FNO-containing gas to a target reactor downstream of the second pressure zone.