B41M 5/368
Involving the creation of a soluble/insoluble or hydrophilic/hydrophobic permeability pattern
Official title: {involving the creation of a soluble/insoluble or hydrophilic/hydrophobic permeability pattern; Peel development (B41M5/366 takes precedence)}
B41M5/368 (Involving the creation of a soluble/insoluble or hydrophilic/hydrophobic permeability pattern) appears on 212 US grants and 139 published applications in this corpus.
Search patents in B41M- Granted patents
- 212
- Published applications
- 139
- Assignees
- 45
- Inventors
- 308
- Latest grant
- 21 Jan 2014
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 0 | 0 |
| 1978 | 1 | 0 |
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 2 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 2 | 0 |
| 1993 | 2 | 0 |
| 1994 | 9 | 0 |
| 1995 | 2 | 0 |
| 1996 | 3 | 0 |
| 1997 | 7 | 0 |
| 1998 | 3 | 0 |
| 1999 | 4 | 0 |
| 2000 | 21 | 0 |
| 2001 | 14 | 2 |
| 2002 | 27 | 10 |
| 2003 | 19 | 16 |
| 2004 | 7 | 24 |
| 2005 | 10 | 33 |
| 2006 | 16 | 14 |
| 2007 | 23 | 12 |
| 2008 | 9 | 8 |
| 2009 | 9 | 10 |
| 2010 | 1 | 6 |
| 2011 | 8 | 3 |
| 2012 | 6 | 1 |
| 2013 | 0 | 0 |
| 2014 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Thermally reactive infrared absorption polymers and their use in a heat sensitive lithographic printing plate21 Jan 2014US 8,632,947 B2Ipagsa Industrial, S.L.
- Imaging member4 Dec 2012US 8,323,803 B2Xerox Corporation
- Positive-working radiation-sensitive imageable elements30 Oct 2012US 8,298,750 B2Eastman Kodak Company
- Pattern forming materials and pattern formation method using the materials29 May 2012US 8,187,786 B2Samsung Electronics Co., Ltd.
- Bakeable lithographic printing plates with a high resistance to chemicals20 Mar 2012US 8,137,891 B2Eastman Kodak Company
- Infrared-sensitive composition for printing plate precursors19 Jan 2012US 2012/0015295 A1
- Thermosensitive imaging composition and lithographic plate comprising the same10 Nov 2011US 2011/0271859 A1
- Positive-working radiation-sensitive imageable elements10 Mar 2011US 2011/0059399 A1Eastman Kodak Company
- Sensitizer/initiator combination for negative-working thermal-sensitive compositions usable for lithographic plates6 Jan 2011US 2011/0003123 A1
- Imaging member7 Oct 2010US 2010/0251914 A1Palo Alto Research Center Incorporated
Most cited
By later US patents
- Radiation-sensitive composition containing a resole resin and a novolac resin and use thereof in lithographic printing plates129US 5,340,699 AEastman Kodak Company · 1994
- Radiation-sensitive composition containing a resole resin and a novolac resin and use thereof in lithographic printing plates79US 5,372,907 AEastman Kodak Company · 1994
- Thermal digital lithographic printing plate79US 6,352,811 B1Kodak Polychrome Graphics LLC · 2002
- Direct-to-Press imaging method using surface modification of a single layer coating73US 5,713,287 ACreo Products Inc. · 1998
- IR-sensitive composition and use thereof for the preparation of printing plate precursors73US 6,309,792 B1Kodak Polychrome Graphics LLC · 2001