Periodic Structures, Inc.
Los Gatos, CA, US· latest recorded location
Periodic Structures, Inc. is named on 5 US grants and 5 published applications in this corpus. Its most frequent classification is G03F (Photomechanical production of textured or patterned surfaces).
- Granted patents
- 5
- Published applications
- 5
- Inventors
- 4
- Granted in 2026 so far
- 0
- Most recent grant
- 3 May 2016
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2013 | 0 | 2 |
| 2014 | 1 | 0 |
| 2015 | 2 | 2 |
| 2016 | 2 | 1 |
By publication year.
Technology areas
Share of 10 documents
Recent patents
- Apparatus and method of direct writing with photons beyond the diffraction limit using two-color resist3 May 2016US 9,329,484 B1
- Apparatus and method of direct writing with photons beyond the diffraction limit5 Apr 2016US 9,304,410 B2
- Apparatus and method of direct writing with photons beyond the diffraction limit using two-color resist24 Nov 2015US 9,195,139 B2
- Apparatus and methods for microscopy having resolution beyond the Abbe limit7 Jul 2015US 9,075,013 B2
- Method of direct writing with photons beyond the diffraction limit4 Feb 2014US 8,642,232 B2
- Apparatus and method of direct writing with photons beyond the diffraction limit using two-color resist14 Apr 2016US 2016/0103394 A1
- Apparatus and method of direct writing with photons beyond the diffraction limit19 Nov 2015US 2015/0331330 A1
- Apparatus and method of direct writing with photons beyond the diffraction limit using two-color resist2 Jul 2015US 2015/0185617 A1
- Apparatus and methods for microscopy having resolution beyond the Abbe limit31 Oct 2013US 2013/0286179 A1
- Apparatus and method of direct writing with photons beyond the diffraction limit23 May 2013US 2013/0130182 A1
Most cited
By later US patents
- Apparatus and method of direct writing with photons beyond the diffraction limit using two-color resist21US 9,329,484 B12016
- Method of direct writing with photons beyond the diffraction limit1US 8,642,232 B22014
- Apparatus and methods for microscopy having resolution beyond the Abbe limit1US 9,075,013 B22015
- Apparatus and method of direct writing with photons beyond the diffraction limit1US 9,304,410 B22016