Apparatus and method of direct writing with photons beyond the diffraction limit using two-color resist
AssigneePeriodic Structures, Inc.
InventorsDavid A. Markle, John S. Petersen
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AssigneePeriodic Structures, Inc.
InventorsDavid A. Markle, John S. Petersen
Estimating the term…
Methods of and apparatus for performing direct-write lithography in a two-color photoresist layer are disclosed. The method includes exposing the two-color photoresist layer with transducer and inhibition images that respectively define bright spots and dark spots. The transducer image generates excited-state photo-molecules while the inhibition image converts the exited-state photo-molecules to an unexcited state that is not susceptible to conversion to an irreversible exposed state. The dark spots and bright spots are aligned, with the dark spots being smaller than the bright spots so that a portion of the excited-state photo-molecules adjacent the periphery of the bright spots absorb the inhibition radiation and transition to the unexcited state while a portion of the excited photo-molecules at the center of bright spots are not exposed to the inhibition light and transition to an irreversible exposed state. This forms in the two-color photoresist layer a pattern of sub-resolution photoresist pixels.
A direct-write lithography apparatus for forming in a two-color photoresist layer on a substrate sub-resolution photoresist pixels, wherein the two-color photoresist layer includes photo-molecules, comprising:
Dependencies are inferred from the claim text.