Mipox Corporation
Yamanashi, JP· latest recorded location
Mipox Corporation is named on 5 US grants and 6 published applications in this corpus. Its most frequent classification is G02B (Optical elements, systems or apparatus).
- Granted patents
- 5
- Published applications
- 6
- Inventors
- 20
- Granted in 2026 so far
- 0
- Most recent grant
- 20 Apr 2021
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2016 | 2 | 1 |
| 2017 | 0 | 0 |
| 2018 | 1 | 3 |
| 2019 | 1 | 0 |
| 2020 | 0 | 0 |
| 2021 | 1 | 0 |
| 2022 | 0 | 0 |
| 2023 | 0 | 1 |
| 2024 | 0 | 0 |
| 2025 | 0 | 1 |
By publication year.
Technology areas
Share of 11 documents
- G02BOptical elements, systems or apparatus5
- B24BMachines, devices, or processes for grinding or polishing4
- G01NInvestigating or analysing materials by determining their chemical or physical properties3
- B24DTools for grinding, buffing or sharpening2
- G01BMeasuring length, thickness or similar linear dimensions2
- H10PGeneric processes or apparatus for the manufacture or treatment of devices covered2
- B23DPlaning1
- C11DDetergent compositions1
- G06TImage data processing or generation, in general1
Recent patents
- Multi-stage batch polishing method for end surface of optical fiber connector, and polishing film20 Apr 2021US 10,981,256 B2
- Polishing sheet equipped with nano-silica polishing particles, and polishing method and manufacturing method for optical fiber connector using polishing sheet22 Oct 2019US 10,451,816 B2
- Method comprising evaluating substrate by polarized parallel light6 Nov 2018US 10,119,920 B2
- Method for manufacturing a circular wafer by polishing the periphery, including a notch or orientation flat, of a wafer comprising crystal material, by use of polishing tape15 Nov 2016US 9,496,129 B2
- Detergent composition with low foam and high nickel solubility20 Sep 2016US 9,447,368 B1
- Polarizing microscope, crystal defect evaluation device, and crystal defect evaluation method22 May 2025US 2025/0164407 A1
- Sheet metal file6 Apr 2023US 2023/0106365 A1
- Multi-stage batch polishing method for end surface of optical fiber connector, and polishing film6 Dec 2018US 2018/0345440 A1
- Polishing sheet equipped with nano-silica polishing particles, and polishing method and manufacturing method for optical fiber connector using polishing sheet29 Nov 2018US 2018/0341068 A1
- Method comprising evaluating substrate by polarized parallel light12 Jul 2018US 2018/0195952 A1
Most cited
By later US patents
- Method comprising evaluating substrate by polarized parallel light3US 10,119,920 B22018
- Polishing sheet equipped with nano-silica polishing particles, and polishing method and manufacturing method for optical fiber connector using polishing sheet1US 10,451,816 B22019
- Multi-stage batch polishing method for end surface of optical fiber connector, and polishing film1US 10,981,256 B22021
- Detergent composition with low foam and high nickel solubility1US 9,447,368 B12016
- Method for manufacturing a circular wafer by polishing the periphery, including a notch or orientation flat, of a wafer comprising crystal material, by use of polishing tape1US 9,496,129 B22016