Method comprising evaluating substrate by polarized parallel light
AssigneesFuji Electric Co., Ltd., Mipox Corporation
InventorsSeiji Mizutani, Kenji Nakagawa, Tomohisa Kato, Kensuke Takenaka
Life of this patent
Estimating the term…
Abstract
There is provided a method that makes it possible to observe fine crystal defects using light of a visible region. The method includes illuminating a substrate with polarized parallel light and evaluating a crystal quality of at least a part of the substrate from an image obtained by light transmitted through or reflected by the substrate. The half width HW, the divergence angle DA, and the center wavelength CWL of the parallel light satisfy conditions given below 3≤HW≤100 0.1≤DA≤5 250≤CWL≤1600 where the center wavelength CWL and the half width HW are expressed in units of nm and the divergence angle DA is expressed in units of mrad.
Claims19
A method comprising:
- illuminating a substrate with polarized parallel light:
- and
- evaluating a crystal quality of at least a part of the substrate from an image obtained by light transmitted through or reflected by the substrate,
- wherein a half width HW, a divergence angle DA, and a center wavelength CWL of the parallel light satisfy conditions given below
- 3≤HW≤100
- 0.1≤DA≤5
- 250≤CWL≤1600
- where the center wavelength CWL and the half width HW are expressed in units of nm and the divergence angle DA is expressed in units of mrad.
Dependencies are inferred from the claim text.