Ether Precision, Inc.
Ether Precision, Inc. is named on 0 US grants and 9 published applications in this corpus. Its most frequent classification is G02B (Optical elements, systems or apparatus).
- Granted patents
- 0
- Published applications
- 9
- Inventors
- 11
- Granted in 2026 so far
- 0
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2006 | 0 | 1 |
| 2007 | 0 | 2 |
| 2008 | 0 | 3 |
| 2009 | 0 | 0 |
| 2010 | 0 | 2 |
| 2011 | 0 | 1 |
By publication year.
Technology areas
Share of 9 documents
- G02BOptical elements, systems or apparatus4
- H04NPictorial communication4
- H10FSolar cells and light sensors3
- Y10TTechnical subjects covered by former us classification3
- C03BManufacture, shaping, or supplementary processes2
- G03BApparatus or arrangements for taking photographs or for projecting or viewing them1
- H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by1
Recent patents
No granted patents yet.
- Image capture unit and methods22 Dec 2011US 2011/0310281 A1
- Imaging device with focus offset compensation23 Dec 2010US 2010/0322610 A1
- Lens assembly and method of manufacture18 Feb 2010US 2010/0039713 A1
- Image capture unit and methods29 May 2008US 2008/0121784 A1
- Manufacturing process of the combining of optical lens and sensor chips22 May 2008US 2008/0115880 A1
Most cited
By later US patents
None of its patents has been cited by a later US patent yet.