Epistar Corporation
Hsinchu, Taiwan, CN· latest recorded location
EPISTAR CORPORATION is named on 1 US grants and 4 published applications in this corpus. Its most frequent classification is H10H (Inorganic light-emitting semiconductor devices having potential barriers).
- Granted patents
- 1
- Published applications
- 4
- Inventors
- 21
- Granted in 2026 so far
- 0
- Most recent grant
- 3 Jul 2018
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2010 | 0 | 1 |
| 2011 | 0 | 0 |
| 2012 | 0 | 0 |
| 2013 | 0 | 0 |
| 2014 | 0 | 0 |
| 2015 | 0 | 0 |
| 2016 | 0 | 2 |
| 2017 | 0 | 1 |
| 2018 | 1 | 0 |
By publication year.
Technology areas
Share of 5 documents
- H10HInorganic light-emitting semiconductor devices having potential barriers3
- H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by3
- H10PGeneric processes or apparatus for the manufacture or treatment of devices covered2
- B23KSoldering or unsoldering1
- H01CResistors1
- H10DInorganic electric semiconductor devices1
- H10FSolar cells and light sensors1
- H10KOrganic electric solid-state devices1
- Y02EClean energy generation and storage1
- Y02PLow-carbon manufacturing1
Recent patents
- A method for forming a virtual germanium substrate using a laser24 Aug 2017US 2017/0244005 A1
- Light-emitting device and method of manufacturing thereof28 Jul 2016US 2016/0218247 A1
- Light-emitting device and manufacturing method thereof2 Jun 2016US 2016/0155894 A1
- Photoelectronic device having a variable resistor structure9 Dec 2010US 2010/0309649 A1
Most cited
By later US patents
None of its patents has been cited by a later US patent yet.