Developing process
AssigneeHitachi Chemical Company, Ltd.
InventorHajime Kakumaru
Life of this patent
Estimating the term…
Abstract
A resist pattern good in resolution and image precision can be obtained by a developing process characterized by jetting a gas on a developing surface during development or after development.
Claims18
A process for developing an image-wise exposed photosensitive material which comprises contacting a surface of the photosensitive material comprising a photo resist in the surface of a printed circuit board or a relief in a printing plate, with a developing solution by immersion or by spraying, while jetting a gas at a pressure of 0.1 to 6 kgf/cm.sup.2 and at the surface of the photosensitive material so as to remove any narrow portions by the development and so as not to dry a developing surface during development of image whereby the image developed has improved resolution with a wall vertical to a substrate.
A process for developing an image-wise exposed photosensitive material which comprises a step of spray jetting a developing solution on a surface of the photosensitive material comprising a photo resist in the production of a printed wiring board or a relief in a printing plate, a step of jetting air at a surface of 0.1 to 6 kgf/cm.sup.2 and at the surface of the photosensitive material so as to remove very narrow portions by the development and so as not to dry a developing surface during development of an image and repeating said steps one or more times whereby the image developed has improved resolution with a wall vertical to a substrate.
A process of developing an image-wise exposed photosensitive material which comprises immersing a surface of the photosensitive material comprising a photo resist in the production of a printed wiring board or a relief in a printing plate, within a developing solution or spraying a surface of the photosensitive material with a developing solution, and jetting a gas at a surface of 0.1 to 6 kgf/cm.sup.2 and at the surface of the photosensitive material so as to remove very narrow portions by the development and so as to not to dry a developing surface during development of an image wherein in a case where the photosensitive material is a negative photosensitive material, non-exposed portions are removed and in a case where the photosensitive material is a positive photosensitive material exposed portions are removed, whereby the image developed has improved resolution with a wall vertical to a substrate.
Dependencies are inferred from the claim text.