Imprint apparatus, imprint method, and article manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorsYU NOMURA, KAZUKI NAKAGAWA
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AssigneeCanon Kabushiki Kaisha
InventorsYU NOMURA, KAZUKI NAKAGAWA
Estimating the term…
An imprint apparatus is provided. The apparatus includes a supplier configured to supply a gas to a space between a mold and an imprint material on a shot region, an irradiator configured to perform light irradiation, and a controller. A plurality of shot regions on a substrate include a full shot region having a size where a pattern region of the mold is fully transferred, and a partial shot region where only a part of the pattern region is transferred because of being located in an outer peripheral portion of the substrate. When performing an imprint process on the partial shot region, the controller reduces a supply amount of a gas from the supplier and increases an amount of irradiation light from the irradiator as compared to a case of performing the imprint process on the full shot region.
An imprint apparatus that performs, on each of a plurality of shot regions on a substrate, an imprint process of forming a pattern on a shot region by curing an imprint material by light irradiation while a mold is in contact with the imprint material on the shot region, comprising:
An imprint method of performing, on each of a plurality of shot regions on a substrate, an imprint process of forming a pattern of an imprint material by using a mold, wherein
Dependencies are inferred from the claim text.