Optical proximity correction method and photomask fabrication method using the same

A method of fabricating a photomask, the method comprising:

• performing an optical proximity correction (OPC) on a line-and-space pattern to generate a correction pattern;
• and
• manufacturing the photomask having the correction pattern,
• wherein performing the OPC includes:
• dividing the line-and-space pattern into a plurality of segments;
• producing a hash value for each of the plurality of segments;
• and
• generating the correction pattern by applying a first correction bias to ones of the plurality of segments having a same hash value, wherein at least two of the plurality of segments have the same hash value,
• wherein producing the hash value includes producing the same hash value for at least two segments of the plurality of segments that have a same pattern image in a query region.

A method of fabricating a semiconductor device, the method comprising:

• performing an optical proximity correction (OPC) on a design pattern to generate a correction pattern;
• using the correction pattern to manufacture a photomask;
• forming an etch target layer and a photoresist layer on a substrate;
• using the photomask to expose and develop the photoresist layer to form a plurality of photoresist patterns;
• and
• using the plurality of photoresist patterns to pattern the etch target layer,
• wherein performing the OPC includes:
• dividing the design pattern into a plurality of segments including a normal segment and an abnormal segment that has a length different than a length of the normal segment;
• creating a first query region of the normal segment;
• creating a second query region of the abnormal segment, the second query region having a pattern image the same as a pattern image of the first query region;
• producing a same hash value for the normal segment and the abnormal segment;
• and
• generating the correction pattern by applying a same correction bias to the normal segment and the abnormal segment that have the same hash value.