US 2010/0059182 A1 · SUBSTRATE PROCESSING APPARATUS

Abstract

A substrate processing apparatus includes a chamber having a reaction space therein, a substrate seating member disposed in the reaction space of the chamber to seat a substrate thereon, an induction heating unit to heat the substrate seating member, and at least one altitude adjusting unit to selectively adjust the altitude of the induction heating unit at the outside of the chamber according to a temperature adjusting region of the substrate seating member. Therefore, it is possible to constantly control a temperature of the substrate seating member by adjusting the distance length between the substrate seating member and the induction heating unit at the outside of the chamber.

Claims17

Dependent claims

A substrate processing apparatus, comprising:

a chamber having a reaction space therein;
a substrate seating member disposed in the reaction space of the chamber to seat a substrate thereon;
an induction heating unit to heat the substrate seating member;
and
at least one altitude adjusting unit to selectively adjust the altitude of the induction heating unit at the outside of the chamber according to a temperature adjusting region of the substrate seating member.

2 more elements

Dependencies are inferred from the claim text.

Substrate processing apparatus

Life of this patent

Substrate processing apparatus

Life of this patent

Abstract

Claims17