Film production method and film produced thereby
AssigneeSeiko Epson Corporation
InventorKatsuyuki Morii
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Abstract
A method of producing an electrically conductive film is provided having excellent conductivity at low cost. The method includes steps of forming a colloid layer on a substrate, and then irradiating the surface of the colloid layer with an energy beam such that higher energy beam absorption occurs in the colloid layer than in the substrate. Preferably, the colloid layer is a metal colloid layer and an electrically conductive film is obtained as the film.
Claims10
A method of producing a film, comprising the steps of:
- forming a colloid layer on a substrate having a surface;
- and
- irradiating the surface of said colloid layer with an energy beam such that higher energy beam absorption occurs in said colloid layer than in said substrate.
A method of producing a semiconductor device, comprising the steps of:
- forming a colloid layer on a substrate having a surface;
- and
- irradiating the surface of said colloid layer with an energy beam such that higher energy beam absorption occurs in said colloid layer than in said substrate.
A method of producing an electronic device, comprising the steps of:
- forming a colloid layer on a substrate having a surface;
- and
- irradiating the surface of said colloid layer with an energy beam such that higher energy beam absorption occurs in said colloid layer than in said substrate.
A method of producing a functional device, comprising the steps of:
- forming a colloid layer on a substrate having a surface;
- and
- irradiating the surface of said colloid layer with an energy beam such that higher energy beam absorption occurs in said colloid layer than in said substrate.
Dependencies are inferred from the claim text.