H01J 3/10
Arrangements for centring ray or beam
Official title: Arrangements for centring ray or beam (H01J3/02, H01J3/04 take precedence)
H01J3/10 (Arrangements for centring ray or beam) appears on 6 US grants and 6 published applications in this corpus.
Search patents in H01J- Granted patents
- 6
- Published applications
- 6
- Assignees
- 5
- Inventors
- 15
- Latest grant
- 3 Sep 2024
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2004 | 0 | 1 |
| 2005 | 0 | 0 |
| 2006 | 1 | 2 |
| 2007 | 0 | 0 |
| 2008 | 1 | 0 |
| 2009 | 0 | 0 |
| 2010 | 1 | 0 |
| 2011 | 0 | 0 |
| 2012 | 0 | 0 |
| 2013 | 1 | 1 |
| 2014 | 0 | 0 |
| 2015 | 0 | 0 |
| 2016 | 0 | 0 |
| 2017 | 0 | 0 |
| 2018 | 0 | 0 |
| 2019 | 0 | 0 |
| 2020 | 0 | 1 |
| 2021 | 1 | 0 |
| 2022 | 0 | 1 |
| 2023 | 0 | 0 |
| 2024 | 1 | 0 |
By publication year.
Recent patents
- Electron gun, electron beam applicator, emission axis verification method for electron beam emitted from photocathode, and emission axis alignment method for electron beam emitted from photocathode3 Sep 2024US 12,080,507 B2Photo electron Soul Inc.
- Electron gun16 Mar 2021US 10,950,407 B2New Japan Radio Co., Ltd.
- Electron beam apparatus and a device manufacturing method by using said electron beam apparatus5 Feb 2013US 8,368,016 B1Ebara Corporation
- Extractor for an microcolumn, an alignment method for an extractor aperture to an electron emitter, and a measuring method and an alignment method using thereof6 Jul 2010US 7,750,295 B2CEBT Co., Ltd.
- Electron beam apparatus and a device manufacturing method by using said electron beam apparatus22 Apr 2008US 7,361,895 B2Ebara Corporation
- Electron gun, electron beam application device, method for verifying emission axis of electron beam emitted from photocathode, and method for aligning emission axis of electron beam emitted from photocathode10 Nov 2022US 2022/0359146 A1Photo electron Soul Inc.
- Electron gun17 Dec 2020US 2020/0395185 A1New Japan Radio Co., Ltd.
- Electron beam apparatus and a device manufacturing method by using said electron beam apparatus7 Feb 2013US 2013/0032716 A1Ebara Corporation
- Electron beam apparatus and a device manufacturing method by using said electron beam apparatus11 May 2006US 2006/0097200 A1Ebara Corporation
- Extractor for an microcolumn, an alignment method for an extractor aperture to an electron emitter, and a measuring method and an alignment method using thereof6 Apr 2006US 2006/0071175 A1CEBT Co., Ltd.
Most cited
By later US patents
- Electron beam apparatus and a device manufacturing method by using said electron beam apparatus18US 7,005,641 B2Ebara Corporation · 2006
- Electron beam apparatus and a device manufacturing method by using said electron beam apparatus1US 7,361,895 B2Ebara Corporation · 2008
- Extractor for an microcolumn, an alignment method for an extractor aperture to an electron emitter, and a measuring method and an alignment method using thereof1US 7,750,295 B2CEBT Co., Ltd. · 2010