Extractor for an microcolumn, an alignment method for an extractor aperture to an electron emitter, and a measuring method and an alignment method using thereof

A position measuring system using electron beam measurement, said system comprising:

• an electron emitter;
• an electron beam measuring device including a plurality of sensing regions through which the electrons of the electron beam can be electrically transmitted, and insulating portions including insulating material for prevention of the electron flow or low-doped semiconductor for reduction of the electron flow and dividing each of the sensing regions;
• connecting portions for electrically conducting the electrons striking on each of the sensing regions;
• and
• measuring portions connected to each of the corresponding sensing regions via said connecting portions and measuring the amount of the electron beam sensed in each of said sensing regions,
• wherein the magnitude and the direction of misalignment of an electron beam measuring device with an electron emitter is determined by measuring and calculating the amount of the electrons on each of the sensing regions.

A method for measuring position using electron beam measurement, said method comprising steps of:

• providing an electron emitter at a first side of an object to be measured;
• providing an electron beam measuring device at a second side of the object to be measured, said electron beam measuring device including a plurality of sensing regions through which the electrons of the electron beam can be electrically transmitted, and insulating portions including insulating material for prevention of the electron flow or low-doped semiconductor for reduction of the electron flow and dividing each of the sensing regions;
• sensing the electrons emitted from said electron emitter in each of the sensing regions;
• verifying position of the sensing regions being in a state of sensing the electrons in said electron beam measuring device and calculating the amount of the electrons striking each of the sensing regions;
• and
• calculating relative position of the first and the second sides on the basis of the measured data related to the position of each of the sensing regions being in a state of sensing the electrons and the striking amount of the electrons.

An alignment method using electron beam measurement, said method comprising steps of:

• providing an electron emitter at a first side of an object to be aligned;
• providing an electron beam measuring device at a second side of the object to be aligned, said electron beam measuring device including a plurality of sensing regions through which the electrons of the electron beam can be electrically transmitted, and insulating portions including insulating material for prevention of the electron flow or low-doped semiconductor for reduction of the electron flow and dividing each of the sensing regions;
• sensing the electrons emitted from said electron emitter in each of the sensing regions;
• verifying position of the sensing regions being in a state of sensing the electrons in said electron beam measuring device and calculating the amount of the electrons striking each of the sensing regions;
• calculating relative position of the first and the second sides on the basis of the measured data related to the position of each of the sensing regions being in a sensing state and the striking amount of the electrons;
• and
• moving either one of the first or second side, or both the first and second sides on the basis of the verified relative position.