G03C 1/61
With non-macromolecular additives
Official title: with non-macromolecular additives
G03C1/61 (With non-macromolecular additives) appears on 57 US grants and 3 published applications in this corpus.
Search patents in G03C- Granted patents
- 57
- Published applications
- 3
- Assignees
- 24
- Inventors
- 116
- Latest grant
- 9 Feb 2016
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 2 | 0 |
| 1977 | 0 | 0 |
| 1978 | 2 | 0 |
| 1979 | 0 | 0 |
| 1980 | 2 | 0 |
| 1981 | 5 | 0 |
| 1982 | 0 | 0 |
| 1983 | 7 | 0 |
| 1984 | 4 | 0 |
| 1985 | 5 | 0 |
| 1986 | 3 | 0 |
| 1987 | 6 | 0 |
| 1988 | 2 | 0 |
| 1989 | 2 | 0 |
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 2 | 0 |
| 1993 | 2 | 0 |
| 1994 | 0 | 0 |
| 1995 | 2 | 0 |
| 1996 | 0 | 0 |
| 1997 | 2 | 0 |
| 1998 | 1 | 0 |
| 1999 | 2 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 1 | 1 |
| 2005 | 1 | 1 |
| 2006 | 1 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 0 |
| 2012 | 0 | 0 |
| 2013 | 0 | 0 |
| 2014 | 0 | 1 |
| 2015 | 0 | 0 |
| 2016 | 1 | 0 |
By publication year. Applications have been published since 2001.
Subgroups
Granted patents
Recent patents
- Positive photosensitive resin composition9 Feb 2016US 9,256,118 B2Cheil Industries Inc.
- Photothermographic element comprising improved base precursors and methods for their use18 Apr 2006US 7,029,835 B2Eastman Kodak Company
- Thermal base precursors13 Dec 2005US 6,974,662 B2Eastman Kodak Company
- Base precursors for use in a photothermographic element2 Mar 2004US 6,699,651 B1Eastman Kodak Company
- Heat development duplicating material comprising ascorbic acid31 Aug 1999US 5,945,247 AFuji Photo Film Co., Ltd.
- Positive Photosensitive Resin Composition19 Jun 2014US 2014/0170562 A1Cheil Industries Inc.
- Thermal base precursors10 Feb 2005US 2005/0032009 A1Eastman Kodak Company
- Photothermographic element comprising improved base precursors and methods for their use23 Sep 2004US 2004/0185352 A1Eastman Kodak Company
Most cited
By later US patents
- Light sensitive, thermally developable imaging system77US 4,370,401 AMinnesota Mining and Manufacturing Company · 1983
- Light-sensitive composition consisting essentially of, in admixture a nonionic aromatic diazo compound and a cationic dye/borate anion complex35US 5,200,292 AFuji Photo Film Co., Ltd. · 1993
- Thermal dye bleach construction33US 5,135,842 AMinnesota Mining and Manufacturing Company · 1992
- Heat-developable light-sensitive material with base precursor particles24US 4,514,493 AFuji Photo Film Co., Ltd. · 1985
- Diazonium imaging system20US 4,394,433 AMinnesota Mining and Manufacturing Company · 1983