G02B 27/4222

In projection exposure systems

Official title: {in projection exposure systems, e.g. photolithographic systems}

G02B27/4222 (In projection exposure systems) appears on 76 US grants and 63 published applications in this corpus.

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Granted patents
76
Published applications
63
Assignees
42
Inventors
183
Latest grant
30 Jun 2026

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G02B 27/4222: granted patents and published applications per publication year
YearGranted patentsPublished applications
199020
199100
199230
199320
199420
199520
199600
199730
199810
199920
200000
200131
200237
200334
200422
200553
200601
200720
200802
200903
201000
201101
201210
201300
201412
201511
201611
201732
201823
201906
202083
202143
202264
202325
202435
202574
202620

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