C03C 2201/24
Containing nitrogen
Official title: containing nitrogen, e.g. silicon oxy-nitride glasses
C03C2201/24 (Containing nitrogen) appears on 20 US grants and 21 published applications in this corpus.
Search patents in C03C- Granted patents
- 20
- Published applications
- 21
- Assignees
- 16
- Inventors
- 64
- Latest grant
- 11 Jan 2022
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2000 | 1 | 0 |
| 2001 | 2 | 1 |
| 2002 | 5 | 2 |
| 2003 | 0 | 0 |
| 2004 | 0 | 1 |
| 2005 | 0 | 0 |
| 2006 | 0 | 1 |
| 2007 | 0 | 0 |
| 2008 | 0 | 3 |
| 2009 | 0 | 1 |
| 2010 | 2 | 1 |
| 2011 | 2 | 1 |
| 2012 | 1 | 0 |
| 2013 | 0 | 1 |
| 2014 | 1 | 0 |
| 2015 | 0 | 1 |
| 2016 | 0 | 2 |
| 2017 | 4 | 2 |
| 2018 | 0 | 1 |
| 2019 | 0 | 2 |
| 2020 | 0 | 0 |
| 2021 | 1 | 0 |
| 2022 | 1 | 0 |
| 2023 | 0 | 0 |
| 2024 | 0 | 0 |
| 2025 | 0 | 0 |
| 2026 | 0 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Color-stable, antimicrobial, porous glass powder and process for producing such a powder at high temperatures and use thereof11 Jan 2022US 11,220,453 B2Trovotech GmbH
- Glass member27 Jul 2021US 11,072,555 B2CoorsTek, Inc.
- Optical component made of quartz glass for use in ArF excimer laser lithography and method for producing the component5 Dec 2017US 9,834,468 B2Heraeus Quarzglas GmbH & Co.KG
- Low attenuation fiber with stress relieving layer and a method of making such3 Oct 2017US 9,778,413 B2Corning Incorporated
- Low attenuation fiber with stress relieving layer and a method of making such26 Sep 2017US 9,772,445 B2Corning Incorporated
- Substrate and semiconductor package comprising the same30 Apr 2026US 2026/0123497 A1Absolics Inc.
- Glass member5 Sep 2019US 2019/0270665 A1CoorsTek, Inc.
- Color-stable, antimicrobial, porous glass powder and process for producing such a powder at high temperatures and use thereof23 May 2019US 2019/0152840 A1Trovotech GmbH
- Optical component made of quartz glass for use in arf excimer laser lithography and method for producing the component1 Mar 2018US 2018/0057391 A1Heraeus Quarzglas GmbH & Co.KG
- Surface nitrided alkali-free glasses cross-reference to related applications21 Sep 2017US 2017/0267571 A1Corning Incorporated
Most cited
By later US patents
- Process for making opaque quartz, for carrying out the process suitable SiO2 granulate, and component of opaque quartz glass23US 6,380,110 B1Heraeus Quarzglas GmbH & Co.KG · 2002
- Quartz glass, heat treating apparatus using quartz glass, and heat treating method13US 6,263,704 B1Kabushiki Kaisha Toshiba · 2001
- Heat treating apparatus using quartz glass12US 6,399,526 B2Kabushiki Kaisha Toshiba · 2002
- Germanium silicon oxynitride high index films for planar waveguides12US 6,408,125 B1Corning Incorporated · 2002
- Component of quartz glass for use in semiconductor manufacture and method for producing the same12US 8,017,536 B2Heraeus Quarzglas GmbH & Co.KG · 2011