OptiPro Systems, LLC
Ontario, NY, US· latest recorded location
OptiPro Systems, LLC is named on 3 US grants and 8 published applications in this corpus. Its most frequent classification is G01B (Measuring length, thickness or similar linear dimensions).
- Granted patents
- 3
- Published applications
- 8
- Inventors
- 16
- Granted in 2026 so far
- 0
- Most recent grant
- 22 Oct 2024
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2011 | 1 | 0 |
| 2012 | 0 | 0 |
| 2013 | 0 | 0 |
| 2014 | 0 | 0 |
| 2015 | 0 | 0 |
| 2016 | 0 | 0 |
| 2017 | 0 | 0 |
| 2018 | 0 | 0 |
| 2019 | 1 | 0 |
| 2020 | 0 | 0 |
| 2021 | 0 | 0 |
| 2022 | 0 | 2 |
| 2023 | 0 | 0 |
| 2024 | 1 | 5 |
| 2025 | 0 | 1 |
By publication year.
Technology areas
Share of 11 documents
Recent patents
- Surface metrology systems and methods thereof22 Oct 2024US 12,123,701 B2
- Modular contact assembly for rotating machine tool27 Aug 2019US 10,391,609 B1
- Method and apparatus for precision polishing of optical components8 Mar 2011US 7,901,270 B2
- Sub-nanometer coordinate measuring machines and methods thereof16 Oct 2025US 2025/0321092 A1
- Reflective co-axial interferometer systems and methods thereof26 Dec 2024US 2024/0426594 A1
- Surface metrology systems and methods thereof5 Dec 2024US 2024/0401938 A1
- Elastic emissions machining systems and methods thereof11 Jul 2024US 2024/0227114 A9
- Reflective interferometer systems and methods thereof11 Jul 2024US 2024/0230311 A1
Most cited
By later US patents
None of its patents has been cited by a later US patent yet.