Active Impulse Systems, Inc.
Natick, MA, US· latest recorded location
Active Impulse Systems, Inc. is named on 9 US grants and 0 published applications in this corpus. Its most frequent classification is G01N (Investigating or analysing materials by determining their chemical or physical properties).
- Granted patents
- 9
- Published applications
- 0
- Inventors
- 7
- Granted in 2026 so far
- 0
- Most recent grant
- 19 Feb 2002
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1998 | 1 | 0 |
| 1999 | 0 | 0 |
| 2000 | 5 | 0 |
| 2001 | 2 | 0 |
| 2002 | 1 | 0 |
By publication year.
Technology areas
Share of 9 documents
Recent patents
- Method and device for measuring the thickness of opaque and transparent films19 Feb 2002US 6,348,967 B1
- Method and device for measuring the thickness of thin films near a sample's edge and in a damascene-type structure3 Jul 2001US 6,256,100 B1
- Method and apparatus for measuring material properties using transient-grating spectroscopy16 Jan 2001US 6,175,421 B1
- Method and apparatus for measuring the concentration of ions implanted in semiconductor materials12 Sep 2000US 6,118,533 A
- Method and device for measuring the thickness of opaque and transparent films27 Jun 2000US 6,081,330 A
No published applications.
Most cited
By later US patents
- Method and device for measuring the thickness of opaque and transparent films78US 5,812,261 A1998
- Method and device for measuring the thickness of opaque and transparent films75US 6,081,330 A2000
- Method and device for measuring the thickness of opaque and transparent films55US 6,348,967 B12002
- Method and device for measuring the thickness of thin films near a sample's edge and in a damascene-type structure51US 6,256,100 B12001
- Method and apparatus for measuring the concentration of ions implanted in semiconductor materials47US 6,052,185 A2000