Lithographic apparatus and device manufacturing method

A lithographic apparatus comprising:

• a projection system configured to project a radiation beam onto a target portion of a substrate;
• a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, the liquid supply system comprising a liquid confinement structure configured to at least partly confine the liquid within the space;
• a chamber arranged to receive a mixture of gas and liquid from the space, the chamber having an exhaust line from the chamber;
• an evacuation system configured to draw the mixture of gas and liquid from the space into the chamber;
• and
• a structure, at the exhaust line, configured to block liquid in the chamber from passing through at least part of the exhaust line.

A device manufacturing method, comprising:

• using a liquid confinement structure to at least partly confine a liquid between a projection system of a lithographic apparatus and a substrate;
• projecting a radiation beam through the liquid onto a target portion of the substrate;
• drawing a mixture of gas and liquid from the space into a chamber through an inlet in a bottom surface of the chamber;
• and
• exhausting gas that is separated from the mixture of gas and liquid through an exhaust line from the chamber.