Exposure apparatus, exposure method, and device manufacturing method

An exposure apparatus that exposes a substrate with exposure light via a liquid, the exposure apparatus comprising:

• an optical system having a terminating optical element that emits the exposure light into an optical path;
• a substrate stage having a holder by which the substrate is held, which is movable relative to and below the optical system;
• and
• a liquid immersion member having an opening through which exposure light is projected, a liquid supply port via which the liquid is supplied to fill the optical path of the exposure light with the liquid, a liquid recovery port, and a fluid supply port that supplies carbon dioxide gas to a gas space, the gas space at least partly surrounding the optical path, the gas space being formed between the liquid immersion member on one side and an upper surface of the substrate and/or an upper surface of the substrate stage on the other side, the carbon dioxide gas being supplied from the fluid supply port in gas phase without liquid,
• wherein:
• the liquid recovery port is disposed such that the upper surface of the substrate faces the liquid recovery port, and
• the fluid supply port is disposed radially outward of the liquid recovery port in a radial direction in relation to an optical axis of the optical system.