Illumination optical unit for projection lithography

An illumination optical unit configured to illuminate an illumination field with illumination light, the illumination unit comprising:

• a raster arrangement comprising raster elements arranged in rows and columns, the raster elements being configured to influence the illumination light to predefine a shape of the illumination field;
• a transfer optical unit configured to superimposingly transfer the illumination light from the raster elements toward the illumination field;
• and
• an illumination angle variation device configured to deflect the illumination light incident on the illumination angle variation device in a deflection plane perpendicular to a direction in a location-dependent manner with different deflection angles, the direction being the direction in which an object in the illumination field is displaced during use of the illumination optical unit,
• wherein:
• the illumination angle variation device comprises an illumination angle variation unit displaceable overall relative to the raster arrangement and configured to generate a deflection angle for the illumination light in the deflection plane;
• and
• the displaceability of the illumination angle variation unit relative to the raster arrangement is configured to influence a magnitude of the deflection angle in the deflection plane.