Method for measuring and calibrating centroid of coarse stage of photolithography tool
AssigneeShanghai Micro Electronics Equipment Co., Ltd.
InventorsLiwei Wu, Junqing Dong
Life of this patent
Estimating the term…
Loading patent…
AssigneeShanghai Micro Electronics Equipment Co., Ltd.
InventorsLiwei Wu, Junqing Dong
Estimating the term…
A method for measuring and calibrating a centroid of a coarse stage of a photolithography tool by means of measuring an offset of the centroid relative to a midpoint of the coarse stage is disclosed. The method includes: individually performing closed-loop controls on parameters of the three degrees of freedom X, Y, and Rz of the coarse stage and converting the parameters into coordinates in a coordinate system of the coarse stage (601); for each of the X and Y directions, estimating a range for the centroid (604), equally dividing the range into N parts (605), and designating each dividing point as an eccentricity (605); obtaining N Rz direction positional deviations by conducting a compensation calibration and a calibration calculation based on each corresponding eccentricity (606-611); comparing a minimum of the N positional deviations with a preset Rz-direction positional deviation threshold (613), completing the measurement if the latter is greater (614), and otherwise designating a range between the eccentricities adjacently in front of and behind the eccentricity corresponding to the minimum positional deviation as a new range for the centroid (616-617) and repeating the measurement until the minimum is smaller than the preset threshold.
A method for measuring and calibrating a centroid of a coarse stage of a photolithography tool by means of measuring an offset of the centroid relative to a midpoint of the coarse stage, comprising the steps of:
Dependencies are inferred from the claim text.