Apparatus and methods for inhibiting immersion liquid from flowing below a sustrate
AssigneeNikon Corporation
InventorChristopher Margeson
Life of this patent
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AssigneeNikon Corporation
InventorChristopher Margeson
Estimating the term…
A substrate stage is provided with an immersion liquid collection member that surrounds at least an alignment feature of the substrate stage used to align the substrate on the stage by engaging alignment structure of the substrate. The collection member is located at least partly below the periphery of the substrate held by the substrate holding member of the substrate stage. The collection member has an uppermost liquid-receiving surface that preferably is spaced below a lowermost surface of the substrate when the substrate is held by the substrate holding member. The collection member collects liquid that flows along the alignment feature so as to prevent that immersion liquid from flowing along the under-surface of the substrate.
A lithographic exposure apparatus that exposes a substrate by forming an image of a pattern through an immersion liquid onto the substrate, the lithographic exposure apparatus comprising:
A method of forming an image of a pattern onto a substrate, the method comprising:
Dependencies are inferred from the claim text.