Dynamic optical head layer and lithography method using the same

A lithography method using a dynamic optical head layer, comprising:

• the substrate preparation step of placing a substrate on a stage;
• the photoresist coating step of coating a photoresist onto the substrate;
• the dynamic optical head layer coupling step of coupling the dynamic optical head layer to the photoresist;
• the pattern formation step of irradiating laser beams, moving the stage, and forming patterns on the substrate;
• and
• the super resolution separation step of separating the dynamic optical head layer from the photoresist,
• wherein the dynamic optical head layer comprises a first dielectric layer formed on a top portion thereof, a second dielectric layer formed on a bottom portion thereof, and an dynamic nano aperture layer formed between the first dielectric layer and the second dielectric layer, the dynamic nano aperture layer being made of a material having optical anisotropy, and the first dielectric layer and the second dielectric layer being made of oxide-based materials, nitride-based materials, and carbide-based materials, and if the laser beams are irradiated in the pattern formation step, dynamic optical nano apertures are formed on the dynamic nano aperture layer to allow the laser beams to be transmitted therethrough to form patterns on the substrate, and
• wherein the material having optical anisotropy is Sb5Se35.

A lithography system using a dynamic optical head layer, comprising:

• a pattern part having a substrate on which patterns are formed;
• the dynamic optical head layer detachably mounted on the substrate;
• and
• a microlens array adapted to allow laser beams incident to the dynamic optical head layer and the pattern part to be focused,
• wherein the dynamic optical head layer comprises a first dielectric layer formed on a top portion thereof, a second dielectric layer formed on a bottom portion thereof, and an dynamic nano aperture layer formed between the first dielectric layer and the second dielectric layer, the dynamic nano aperture layer being made of a material having optical anisotropy, the first dielectric layer and the second dielectric layer being made of oxide-based materials, nitride-based materials, and carbide-based materials, and the material having optical anisotropy being Sb65Se35.