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US 9,177,838 B2Granted
Liquid process apparatus and liquid process method
AssigneeTokyo Electron Limited
InventorsNorihiro Ito, Kazuhiro Aiura, Naoki Shindo, Yosuke Hachiya, Takashi Nagai
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Abstract
A top plate 32 is provided to be moved in a horizontal direction between an advanced position, in which the top plate 32 covers from above a substrate W held by a substrate holding unit 21, and a retracted position that is retracted from the advanced position. An air hood 70 configured to supply a purified gas downward is provided to be lifted between a lower position, in which the air hood covers from above the substrate W held by the substrate holding unit 21, and an upper position located above the lower position.
Claims13
A liquid process apparatus comprising:
- a substrate holding unit configured to hold a substrate in a horizontal direction;
- a nozzle configured to supply a process liquid to the substrate held by the substrate holding unit;
- a cup located radially outside around the substrate when the substrate is held by the substrate holding unit, and configured to receive the process liquid supplied to the substrate by the nozzle;
- a top plate that moves in the horizontal direction between an advanced position, in which the top plate covers, from above, the substrate held by the substrate holding unit, and a retracted position, in which the top plate is retracted from the advanced position;
- and
- an air hood configured to supply a purified gas downward and move in the vertical direction between an air hood lower position, in which the air hood covers, from above, the substrate held by the substrate holding unit, and an air hood upper position located above the air hood lower position.
3 more elements
Dependencies are inferred from the claim text.