Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film

A positive photosensitive resin composition, comprising

• (A) an alkali soluble resin prepared using a phosphorous-containing diamine represented by the following Chemical Formula 1 and an aromatic diamine,
• wherein the phosphorous-containing diamine and the aromatic diamine are mixed at a weight ratio of about 10:90 to about 70:30,
• wherein the alkali soluble resin comprises a polybenzoxazole precursor including a repeating unit represented by the following Chemical Formula 4 and a repeating unit represented by the following Chemical Formula 10:
• wherein in Chemical Formula 4,
• X1 is a residual group derived from a phosphorous-containing diamine represented by the following Chemical Formula 1:
• wherein in Chemical Formula 1,
• R′ and R″ are the same or different and are each independently hydrogen, substituted or unsubstituted C1 to C20 alkyl, substituted or unsubstituted C2 to C20 alkenyl, substituted or unsubstituted C2 to C20 alkynyl, substituted or unsubstituted C1 to C20 alkoxy, substituted or unsubstituted C3 to C20 cycloalkyl, substituted or unsubstituted C3 to C20 cycloalkenyl, substituted or unsubstituted C3 to C20 cycloalkynyl, substituted or unsubstituted C2 to C20 heterocycloalkyl, substituted or unsubstituted C2 to C20 heterocycloalkenyl, substituted or unsubstituted C2 to C20 heterocycloalkynyl, or substituted or unsubstituted C6 to C30 aryl,
• R is substituted or unsubstituted C1 to C20 alkyl, substituted or unsubstituted C2 to C20 alkenyl, substituted or unsubstituted C2 to C20 alkynyl, substituted or unsubstituted C1 to C20 alkoxy, substituted or unsubstituted C3 to C20 cycloalkyl, substituted or unsubstituted C3 to C20 cycloalkenyl, substituted or unsubstituted C3 to C20 cycloalkynyl, substituted or unsubstituted C2 to C20 heterocycloalkyl, substituted or unsubstituted C2 to C20 heterocycloalkenyl, substituted or unsubstituted C2 to C20 heterocycloalkynyl, or substituted or unsubstituted C6 to C30 aryl, and
• n′ and n″ are the same or different and are each independently integers ranging from 0 to 3,
• and Y1 is a substituted or unsubstituted C6 to C30 aromatic organic group, substituted or unsubstituted divalent to hexavalent C1 to C30 aliphatic organic group, or substituted or unsubstituted divalent to hexavalent C3 to C30 alicyclic organic group:
• wherein in Chemical Formula 10,
• X2 is a residual group derived from aromatic diamine represented by the following Chemical Formula 8, Chemical Formula 9, or a combination thereof:
• wherein in Chemical Formulae 8 and 9,
• A is a single bond, —O—, —CO—, —CR4R5—, —SO2—, or —S—, wherein R4 and R5 are the same or different and are each independently hydrogen or substituted or unsubstituted C1 to C30 alkyl,
• R1 to R3 are the same or different and are each independently hydrogen, substituted or unsubstituted C1 to C30 alkyl, a substituted or unsubstituted C1 to C30 carboxyl group, a hydroxy group, or a thiol group,
• n1 is an integer ranging from 0 to 2, and
• N2 and n3 are the same or different and are each independently an integer ranging from 0 to 3, and
• Y2 is a substituted or unsubstituted C6 to C30 aromatic organic group, substituted or unsubstituted divalent to hexavalent C1 to C30 aliphatic organic group, or substituted or unsubstituted divalent to hexavalent C3 to C30 alicyclic organic group;
• (B) a photosensitive diazoquinone compound;
• and
• (C) a solvent.