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US 9,000,404 B2Granted
Systems and methods for optics cleaning in an EUV light source
AssigneeASML Netherlands B.V.
InventorsAlexander N. Bykanov, Silvia De Dea, Alexander I. Ershov, Vladimir B. Fleurov, Igor V. Fomenkov, William N. Partlo
Life of this patent
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Abstract
An extreme-ultraviolet (EUV) light source is described herein comprising an optic; a primary EUV light radiator generating an EUV light emitting plasma and producing a deposit on said optic; and a cleaning system comprising a gas and a secondary light radiator, the secondary light radiator generating a laser produced plasma and producing a cleaning species with the gas.
Claims16
An extreme ultraviolet (EUV) light source comprising;
- a chamber;
- an optic;
- a primary EUV light radiator generating in said chamber using first target material droplets an EUV light emitting plasma and producing a deposit on said optic;
- and
- a cleaning system generating in said chamber a laser produced plasma having cleaning species, said laser produced plasma having cleaning species is different from said EUV light emitting plasma, wherein said laser produce plasma having cleaning species is generated during intervening periods when said EUV light emitting plasma is not generated, wherein said primary EUV light radiator is a laser produced plasma and said light source further comprises a material delivery system having at least one component that is used to generate said first source material droplets for said primary EUV light radiator and second target material droplets for use in generating said laser produced plasma having cleaning species.
2 more elements
A method for generating EUV light, comprising:
- providing a chamber;
- providing an optic;
- generating in said chamber, using a primary EUV light radiator and first target material droplets, an EUV light emitting plasma, wherein said EUV light emitting plasma producing a deposit on said optic;
- and
- generating in said chamber, using a cleaning system, said laser produced plasma having cleaning species, said laser produced plasma having cleaning species is different from said EUV light emitting plasma, wherein said laser produce plasma having cleaning species is generated during intervening periods when said EUV light emitting plasma is not generated, wherein the primary EUV light radiator is a laser produced plasma and said method further comprises providing a material delivery system having at least one component that is used to generate said first target material droplets for said primary EUV light radiator and second target material droplets for use in generating said laser produced plasma having cleaning species.
2 more elements
Dependencies are inferred from the claim text.