Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsMartinus Hendrikus Antonius Leenders, Nicolaas Rudolf Kemper, Joost Jeroen Ottens
Life of this patent
Estimating the term…
Abstract
An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.
Claims20
A lithographic apparatus, comprising:
- a projection system;
- a table configured to hold a substrate to be imaged by the projection system;
- and
- a liquid supply system configured to provide a space between the projection system and the substrate with liquid, at least a part of the liquid supply system being moveable relative to and independent of the projection system and the substrate;
- and
- a controller configured to control the amount of supply of the liquid based on direction of movement of the at least part of the liquid supply system.
A device manufacturing method, comprising:
- supplying a liquid between a projection system and a substrate using a liquid supply system;
- using the projection system to project a patterned beam of radiation onto the substrate through the liquid;
- moving the substrate under the projection system;
- moving at least a part of the liquid supply system relative to and independent of the projection system and the substrate;
- and
- controlling the amount of supply of the liquid based on direction of movement of the at least part of the liquid supply system.
A computer-readable non-transitory storage medium having a computer program stored therein to cause a computer to execute a method comprising:
- using a projection system to project a patterned beam of radiation onto a substrate through a liquid between the projection system and the substrate;
- moving at least a part of a liquid supply system relative to and independent of the projection system and the substrate, the liquid supply system used to supply the liquid between the projection system and the substrate;
- and
- controlling the amount of supply of the liquid by the liquid supply system based on direction of movement of the at least part of the liquid supply system.
Dependencies are inferred from the claim text.