US 8,771,529 B1 · Method for imprint lithography

Abstract

A method of imprint lithography includes imprinting a first pattern with a first template on a first substrate of a lithographic template. A second pattern is imprinted with a second template on the substrate of the lithographic template. The first pattern and the second pattern at least partially overlap, thus forming a third pattern. The third pattern is lithographically formed on a second substrate with the lithographic template. In an embodiment, the first pattern is a concentric line pattern formed by thin film deposition. In an embodiment, the second pattern is a radial line pattern. In an embodiment the first pattern and the second pattern may have line frequency increased.

Claims19

Dependent claims

A method comprising:

imprinting a first pattern with a first template on a first substrate of a lithographic template;
imprinting a second pattern with a second template on said first substrate of said lithographic template, wherein:
said first pattern and said second pattern at least partially overlap;
and
said first pattern and said second pattern form a third pattern;
and
lithographically forming said third pattern on a second substrate with said lithographic template.

4 more elements

Dependencies are inferred from the claim text.

Facts

Application

12/894,640Filed 30 Sep 2010

Granted

8 Jul 2014

Term ends

Not estimatedThe source records don’t support an estimate.

Classification4 codes

B29C 59/022
By mechanical means, e.g. pressing: characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping…
G03F 7/0002
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g.…
B29C
Shaping or joining of plastics
G03F
Photomechanical production of textured or patterned surfaces

Method for imprint lithography

Life of this patent

Method for imprint lithography

Life of this patent

Abstract

Claims19