US 8,771,420 B2Granted

Substrate processing apparatus

AssigneeSamsung Display Co., Ltd.

InventorsHeung-Yeol Na, Ki-Yong Lee, Jin-Wook Seo, Min-Jae Jeong, Jong-Won Hong, Eu-Gene Kang, Seok-Rak Chang, Yun-Mo Chung, Tae-Hoon Yang, Byung-Soo So, Byoung-Keon Park, Dong-Hyun Lee, Kil-Won Lee, Jong-Ryuk Park, Bo-Kyung Choi, Ivan Maidanchuk, Won-Bong Baek, Jae-Wan Jung

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Abstract

A substrate processing apparatus that forms thin films on a plurality of substrates and thermally processes the substrates, by uniformly heating the substrates. The substrate processing apparatus includes a processing chamber, a boat in which substrates are stacked, an external heater located outside of the processing chamber, a feeder to move the boat into and out of the processing chamber, a lower heater located below the feeder, and a central heater located in the center of the boat.

Claims18

Dependent claims

A substrate processing apparatus, comprising:

a processing chamber;
a boat to house substrates;
an external heater having a shape of a furnace and surrounding at least 3 sides of the processing chamber;
a feeder to move the boat in and out of the processing chamber, the feeder comprising a lower heater disposed below the boat;
and
a central heater located in a center of the boat,
wherein the external heater comprises a first heater disposed along a top surface of the processing chamber, the first heater being parallel to the top surface of the processing chamber, and
wherein the center of the boat is substantially at a center of a height between a top and a bottom of the boat, the bottom of the boat corresponding to a side of the processing chamber that is not surrounded by the external heater.

5 more elements

Dependencies are inferred from the claim text.