Automatic wafer data sample planning and review
AssigneeInternational Business Machines Corporation
InventorsNathalie Casati, David DeMaris, Maria Gabrani, Ronald P. Luijten
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Abstract
A method of constructing a mask for use in semiconductor device manufacturing is disclosed. A first shape that is related to mask construction is selected from a set of shapes. A second shape related to the mask construction is selected from the set of shapes. The first shape and the second shape are represented using a first shape vector and a second shape vector, respectively. A cluster is formed that includes the first shape and the second shape when the first shape vector and the second shape vector are within a selected criterion.
Claims18
A method of constructing a mask for use in semiconductor device manufacturing, the method comprising:
- selecting, using a processor, a first shape related to mask construction from a set of shapes;
- selecting a second shape related to the mask construction from the set of shapes;
- representing the first shape using a first shape vector that includes coefficients that are indicative of the first shape;
- and the second shape using a second shape vector that includes coefficients that are indicative of the second shape;
- and
- forming a cluster that groups the first shape with the second shape when a distance metric between the coefficients of the first shape vector and the coefficients of the second shape vector is less than a selected criterion.
A non-transitory computer readable storage medium having computer readable program code embodied therewith, the computer readable program code comprising instructions that, when executed by a processor, enable the processor to construct a mask for use in semiconductor device manufacturing, wherein the computer-readable program code includes instructions to:
- select a first shape related to mask construction from a set of shapes;
- select a second shape related to the mask construction from the set of shapes;
- represent the first shape using a first shape vector that includes coefficients that are indicative of the first shape and the second shape using a second shape vector that includes coefficients that are indicative of the second shape;
- and
- form a cluster that groups the first shape with the second shape when a distance metric between the coefficients of the first shape vector and the coefficients of the second shape vector is less than a selected criterion.
Dependencies are inferred from the claim text.