Chemical liquid supply unit, and substrate treating apparatus and method using the same

A substrate treating apparatus comprising:

• a substrate support member supporting a substrate;
• a nozzle arm including a plurality of nozzles configured to discharge liquid onto the substrate;
• a waiting port configured to receive the plurality of nozzles installed in the nozzle arm when the plurality of nozzles wait for performing processes,
• the waiting port being at a side portion of the substrate support member,
• the waiting port including,
• a first housing having an opened top portion and sidewalls, the first housing providing a nozzle receiving space for receiving the plurality of nozzles, and
• organic solvent supply members that enter the housing through the sidewalls of the housing,
• the organic solvent supply members one-to-one corresponding to the plurality of nozzles received in the housing,
• the organic solvent supply members configured to supply organic solvent to a front end of a nozzle selected from the corresponding nozzles;
• and
• a storage port configured to provide a recessed space for receiving the plurality of nozzles,
• the storage port being at a side of the waiting port,
• the storage port including,
• a second housing having an opened top portion and a downwardly convex bottom wall defining a recessed region, and
• an organic solvent supply member disposed in an inclined wall of the downwardly convex bottom wall, the organic solvent supply member configured to supply the organic solvent to the recessed space.