Coating treatment method, computer-readable storage medium, and coating treatment apparatus

A substrate coating treatment method, comprising:

• a first step of rotating a substrate at a first rotation speed and applying a coating solution to the rotated substrate;
• a second step of decelerating the rotation of the substrate to a second rotation speed lower than the first rotation speed to rotate the substrate at the low speed;
• a third step of accelerating the rotation of the substrate to a third rotation speed higher than the second rotation speed, and supplying a solvent for the coating solution and/or a dry gas to the coating solution on the substrate;
• and
• a fourth step of accelerating the rotation of the substrate to a fourth rotation speed higher than the third rotation speed to dry the coating solution on the substrate,
• wherein in said third step, the solvent for the coating solution is supplied to a portion of the coating solution on the substrate thicker than a set thickness determined in advance, and the dry gas is supplied to a portion of the coating solution on the substrate thinner than the set thickness,
• wherein in said fourth step, the solvent for the coating solution is supplied to the portion of the coating solution on the substrate thicker than the set thickness, and
• wherein the fourth step comprising maintaining the rotation of the substrate at said fourth rotation speed for a predetermined time period, and when the solvent for the coating solution is supplied in said fourth step, the rotation of the substrate is temporarily decelerated from the fourth rotation speed.

A substrate coating treatment method, comprising:

• a first step of rotating a substrate at a first rotation speed and applying a coating solution to the rotated substrate;
• a second step of decelerating the rotation of the substrate to a second rotation speed lower than the first rotation speed to rotate the substrate at the low speed;
• a third step of accelerating the rotation of the substrate to a third rotation speed higher than the second rotation speed, and supplying a solvent for the coating solution and/or a dry gas to the coating solution on the substrate;
• and
• a fourth step of accelerating the rotation of the substrate to a fourth rotation speed higher than the third rotation speed to dry the coating solution on the substrate,
• wherein in said third step, the solvent for the coating solution is supplied to a portion of the coating solution on the substrate thicker than a set thickness determined in advance, and the dry gas is supplied to a portion of the coating solution on the substrate thinner than the set thickness;
• and
• wherein the thickness of the coating solution within the substrate is measured in said second step during rotation of the substrate, and the solvent for the coating solution and/or the dry gas are/is supplied based on the measurement result of the thickness of the coating solution in said third step.