Methods of eliminating pattern collapse on photoresist patterns
AssigneeMicron Technology, Inc.
InventorsJon Daley, Yoshiki Hishiro
Life of this patent
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Abstract
A stabilizing solution for treating photoresist patterns and methods of preventing profile abnormalities, toppling and resist footing are disclosed. The stabilizing solution comprises a non-volatile component, such as non-volatile particles or polymers, which is applied after the photoresist material has been developed. By treating the photoresist with the solution containing a non-volatile component after developing but before drying, the non-volatile component fills the space between adjacent resist patterns and remains on the substrate during drying. The non-volatile component provides structural and mechanical support for the resist to prevent deformation or collapse by liquid surface tension forces.
Claims10
A semiconductor construct comprising:
- a substrate;
- a photoresist pattern over the substrate, the photoresist pattern comprising at least two adjacent pattern structures having a top surface and a side surface formed over a surface of the substrate;
- and
- a non-metallic, non-volatile component provided between the at least two adjacent pattern structures adjacent said side surface and not adjacent said top surface to provide mechanical support to the photoresist pattern.
A semiconductor construct comprising:
- a substrate;
- a photoresist pattern over the substrate, the photoresist pattern comprising at least two adjacent pattern structures formed over a surface of the substrate;
- and
- a non-metallic, non-volatile component provided between the at least two adjacent pattern structures, wherein the non-volatile component provides mechanical support to the photoresist pattern,
- wherein the non-metallic, non-volatile component comprises non-volatile particles selected from the group consisting of silica particles, graphite particles, latex spheres and Bucky balls.
A semiconductor construct comprising:
- a substrate;
- a photoresist pattern over the substrate, the photoresist pattern comprising at least two adjacent pattern structures formed over a surface of the substrate;
- and
- a non-metallic, non-volatile component provided between the at least two adjacent pattern structures, wherein the non-volatile component provides mechanical support to the photoresist pattern,
- wherein the non-metallic, non-volatile component comprises non-volatile particles comprising at least one precipitant material that is chosen from at least one of glucose and starch.
Dependencies are inferred from the claim text.