Optical proximity correction aware integrated circuit design optimization
AssigneeSynopsys, Inc.
InventorsQiang Chen, Sridhar Tirumala
Life of this patent
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AssigneeSynopsys, Inc.
InventorsQiang Chen, Sridhar Tirumala
Estimating the term…
An EDA method is implemented for modifying a layout file after place and route. The method includes storing a library of shape modifications for cells in the design library used for implementation of the circuit. The library of shape modifications includes the results of process-specific calibration of the shape modifications which indicate adjustment of a circuit parameter caused by applying the shape modifications to the cells. The layout file is analyzed to identify a cell for adjustment of the circuit parameter. A shape modification calibrated to achieve the desired adjustment is selected from the library. The shape modification is applied to the identified cell in the layout file to produce a modified layout file. The modified layout file can be used for tape out, and subsequently for manufacturing of an improved integrated circuit.
A method for modifying a layout file specifying an integrated circuit design including a plurality of cells, the layout file specifying shapes of components of the cells, placements of the plurality of cells, and interconnections among the cells, the method comprising:
A data processing system adapted for performing a convolution of a kernel over a layout, comprising:
An article of manufacture comprising:
An article of manufacture comprising:
An integrated circuit comprising:
An article of manufacture comprising:
Dependencies are inferred from the claim text.