Method for forming semiconductor structure having protection layer for preventing laser damage
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsJian-Hong Lin, Kang-Cheng Lin, Tzu-Li Lee
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsJian-Hong Lin, Kang-Cheng Lin, Tzu-Li Lee
Estimating the term…
A method for forming a semiconductor structure is provided to prevent energy that is used to blow at least one fuse formed on a metal layer above a semiconductor substrate from causing damage on the structure. The semiconductor structure includes a device, guard ring, protection ring, and at least one protection layer. The device is constructed on the semiconductor substrate underneath the fuse. A seal ring, which surrounds the fuse, is constructed on at least one metal layer between the device and the fuse for confining the energy therein. The protection layer is formed within the seal ring, on at least one metal layer between the device and the fuse for shielding the device from being directly exposed to the energy.
A method for forming a semiconductor structure for preventing energy that is used to blow at least one fuse formed on a metal layer above a semiconductor substrate from causing damage, the method comprising:
A method for forming a semiconductor structure for preventing a laser beam that is used to blow at least one fuse formed on a metal layer above a semiconductor substrate from causing damage, the method comprising:
Dependencies are inferred from the claim text.