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US 8,541,158 B2Granted
Positive resist compositions and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsWataru Kusaki, Takeshi Kinsho, Takeru Watanabe
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Abstract
A positive resist composition is provided comprising an acid generator, a resin component which generates resin-solubilizing groups under the action of acid so that the resin component becomes soluble in an alkaline developer, at least some resin-solubilizing groups being carboxyl groups, and a compound for activating or condensing a carboxyl group. When processed by the lithography, the resist composition forms a resist pattern having a very high resolution and good mask fidelity.
Claims7
A positive resist composition comprising:
- a compound which generates an acid in response to actinic light or radiation,
- a resin component which becomes soluble in an alkaline developer under the action of an acid, the resin component generating resin-solubilizing groups under the action of acid, at least some of the resin-solubilizing groups being carboxyl groups, and
- a compound for activating or condensing a carboxyl group, in the form of a carbodiimide or triazine base condensing agent.
Dependencies are inferred from the claim text.