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US 8,541,149 B2Granted
Method of adhering lithographic pellicle and adhering apparatus therefor
AssigneeShin-Etsu Chemical Co., Ltd.
InventorYuichi Hamada
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AssigneeShin-Etsu Chemical Co., Ltd.
InventorYuichi Hamada
Estimating the term…
A method of adhering a lithographic pellicle includes steps of pressing the pellicle frame 6 toward the exposure stencil 5 by a pressure plate 2 via a bag 3 containing a low viscosity liquid being mounted on the surface of the pressure plate 2 facing the pellicle frame 6 so as to be along sides of the pellicle frame 6 and face the pellicle frame 6, the compressively deformable member being easily deformable when a pressure is applied thereonto. According to the thus constituted method of adhering a pellicle, it is possible to uniformize a pressure applied onto an exposure stencil 5 such as a photomask, a reticle or the like via a pellicle frame 6 when a pellicle is adhered onto the exposure stencil 5.
A method of adhering a pellicle for lithography comprising a step of adhering a frame-like shaped pellicle frame onto an exposure stencil, the method further comprising a step of pressing the pellicle frame toward the exposure stencil by a pressure plate via a compressively deformable member mounted on the surface of the pressure plate in such a manner that it can meet the sides of the pellicle frame, the frame-like shaped compressively deformable member being easily deformable when a pressure is applied thereto.
An adhering apparatus for a pellicle for lithography comprising a pressure plate for pressing a frame-like shaped pellicle frame of a pellicle toward an exposure stencil, wherein a frame-like shaped compressively deformable member easily deformable when being pressed is mounted on the surface of the pressure plate facing the pellicle frame aligned to meet the sides of the pellicle frame.
Dependencies are inferred from the claim text.