Method for making a laminated chip and method for aligning a lithographic mask
AssigneeMax Echo Technology Corporation
InventorChi-Chi Huang
Life of this patent
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Abstract
A method for making a laminated chip includes: (a) forming a first conductive layer on a substrate; (b) forming an insulating layer on the first conductive layer opposite to the substrate; (c) bombarding the insulating layer using an electron beam to form a plurality of holes that expose the first conductive layer; and (d) forming a second conductive layer on the insulating layer such that a part of the second conductive layer extends into the holes to electrically connect to the first conductive layer.
Claims3
A method for aligning a lithographic mask using an aligning device, the lithographic mask having mask alignment marks, the aligning device having a base that is formed with at least two separated light-transmissible sections, the method comprising:
- (a) disposing a light-transmissible film on the base;
- (b) bombarding the light-transmissible film at regions corresponding to the light-transmissible sections of the base using an electron beam so as to form film alignment marks on the light-transmissible film;
- and
- (c) disposing the lithographic mask on the light-transmissible film in a way that the mask alignment marks on the lithographic mask are aligned with the film alignment marks on the light-transmissible film.
Dependencies are inferred from the claim text.