Method for producing PVD coatings
AssigneeSandvik Intellectual Property AB
InventorsErik Wallin, Ulf Helmersson
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Abstract
The present invention relates to a method of producing coatings of metal oxide, nitride or carbide or mixtures thereof, whereby operating a High Power Impulse Magnetron Sputtering, HIPIMS, discharged on one or more target (s) (3), in an argon and reactive gas mixture (5, 6), at peak pulse power higher than 200 Wcm−2, in which the deposition rate is improved and in the need for partial reactive gas pressure feedback systems is eliminated.
Claims26
Method for depositing a coating of crystalline metal oxide, nitride or carbide or mixtures thereof, comprising operating a High Power Impulse Magnetron Sputtering, HIPIMS, discharge on one or more target(s), in a mixture of argon and a reactive gas, at a peak pulse power higher than 200 Wcm−2, a pulse length up to 100 μs and a repetition frequency from 100 Hz.
Method for depositing a coating of crystalline metal oxide, nitride or carbide or mixtures thereof, comprising operating a High Power Impulse Magnetron Sputtering, HIPIMS, discharge on one or more target(s), in a mixture of argon and a reactive gas, at a peak pulse power higher than 200 Wcm−2, a pulse length up to 100 μs and a repetition frequency from 100 Hz, wherein said coating comprises a two phase oxide, or a mixed oxide of the type (Al1−xMex)2O3 or spinel (Me)xAl2O3+x, where 0<x≦1 and where Me is one or more of the metals of the group Mg, Zn, Mn, Fe, Co, Ni, Zr, Cd, Cu, Cr and Sn.
A cutting tool comprising a substrate of a hard material and a coating of oxide, nitride or carbide or mixtures thereof, wherein said coating is deposited by operating a High Power Impulse Magnetron Sputtering, HIPIMS, discharge on one or more target(s), in a mixture of argon and a reactive gas, at peak pulse power higher than 200 Wcm−2, a pulse length of up to 100 μs and a repetition frequency from 100 Hz.
A cutting tool comprising a substrate of a hard material and a coating of oxide, nitride or carbide or mixtures thereof, wherein said coating is deposited by operating a High Power Impulse Magnetron Sputtering, HIPIMS, discharge on one or more target(s), in a mixture of argon and a reactive gas, at peak pulse power higher than 200 Wcm−2, a pulse length of up to 100 μs and a repetition frequency from 100 Hz, wherein said coating comprises a two phase oxide, or a mixed oxide of the type (Al1−xMex)2O3 or spinel (Me)xAl2O3+x, where 0<x≦1 and where Me is one or more of the metals of the group Mg, Zn, Mn, Fe, Co, Ni, Zr, Cd, Cu, Cr and Sn.
Dependencies are inferred from the claim text.