Substrate liquid processing apparatus

A substrate liquid processing apparatus comprising:

• a substrate holding table configured to hold a substrate:
• a rotary driving unit configured to rotate the substrate holding table;
• a process-liquid supply unit configured to supply a process-liquid to the substrate held by the substrate holding table:
• a guide rotary cup provided around the substrate holding table, the guide rotary cup being configured to rotate together with the substrate holding table to guide the process-liquid scattering from the rotating substrate;
• and
• guide cup provided around the guide rotary cup, the guide cup being, configured to guide downward the process-liquid guided by the guide rotary cup,
• wherein the guide cup includes a guide cup body, a downward extension portion extending downward from an inner peripheral end portion of the guide cup body, and an inner peripheral extension portion extending inward from the inner peripheral end portion more than the downward extension portion, the inner peripheral extension portion being configured to form a gas guide space together with the guide rotary cup and the downward extension portion so that a gas turning by the rotation of the guide rotary cup is guided downward,
• wherein a cross-section from the inner peripheral extension portion of the guide cup to the downward extension portion is formed in a reverse U-shape.

A substrate liquid processing apparatus comprising:

• a substrate holding table configured to hold a substrate:
• rotary driving unit configured to rotate the substrate holding table;
• a process-liquid supply unit configured to supply a process-liquid to the substrate held by the substrate holding table;
• a guide rotary cup provided around the substrate holding table, the guide rotary cup being configured to rotate together with the substrate holding table to guide the process-liquid scattering from the rotating substrate;
• and
• a guide cup provided around the guide rotary cup, the guide cup being configured to guide downward the process-liquid guided by the guide rotary cup,
• wherein the guide cup includes a guide cup body, a downward extension portion extending downward from an inner peripheral end portion of the guide cup body, and an inner peripheral extension portion extending inward from the inner peripheral end portion more than the downward extension portion, the inner peripheral extension portion being configured to form a gas guide space together with the guide rotary cup and the downward extension portion so that a gas turning by the rotation of the guide rotary cup is guided downward,
• wherein a gap portion is formed between an outer peripheral end portion of the guide rotary cup and an outer peripheral end portion of the substrate holding table so that the process-liquid scattering from the substrate passes through the gap portion, and
• a lower end portion of the downward extension portion of the guide cup is disposed above the gap portion.