Annealing a buffer layer for fabricating electronic devices on compliant substrates

A method of manufacturing a layered electronic device over a flexible plastic substrate, comprising:

• depositing a buffer layer over said flexible plastic substrate;
• forming a metal layer over and in physical contact with said buffer layer to thereby form a layer structure, such that said layer structure has a first lateral dimension and an induced first strain in said buffer layer;
• heating said layer structure to an anneal temperature which is greater than the temperature at which the plastic substrate, the buffer layer, and the metal layer plastically deform such that said layer structure is deformed to have a second lateral dimension greater than said first lateral dimension and inducing a second strain in said buffer layer greater than said first strain;
• cooling the layer structure such that said layer structure remains substantially at said second lateral dimension, and substantially with at least said second strain in said buffer layer;
• following said cooling, forming over said metal layer a layered electronic device such that:
• said metal layer forms a first metal layer of said electronic device;
• said forming includes patterning of said metal layer;
• said layered electronic device deposited at a temperature that does not exceed said anneal temperature such that upon cooling said flexible plastic substrate, said buffer layer, and said layered electronic device formed thereover substantially return to said second lateral dimension;
• and
• said layered electronic device is formed so as to be free at lateral edges thereof such that stress therein may be relieved through bending and stretching of the device with the substrate.