Exposure apparatus and correction apparatus

An exposure apparatus configured to expose a pattern of an original on a substrate by using light from a light source, said exposure apparatus comprising:

• an illumination optical system configured to illuminate the original by polarized light by using the light from the light source;
• a correction unit configured to correct misalignment of an optical axis of the light from the light source and an optical axis of the illumination optical system;
• and
• a detecting device configured to detect the misalignment of the optical axes,
• wherein the correction unit includes a first lens and a deflecting member, the first lens can move in a direction perpendicular to an optical axis of the first lens, and a deflecting direction of the light deflected by the deflecting member is variable,
• wherein the correction unit moves at least one of the first lens and the deflecting member, and corrects the misalignment of the optical axes based on a result detected by the detecting unit,
• wherein the detecting unit comprises:
• a first detecting unit configured to detect a positional misalignment X1 of the misalignment of the optical axes;
• and
• a second detecting unit configured to detect an angular misalignment X2 of the misalignment of the optical axes, and
• wherein the detecting unit further comprises:
• a control unit configured to set a traveling distance Sx of the first lens and a driving amount Tx of the deflecting member by using constants a to d as follows:
• Sx=(d·X1−b·X2)/(a·d−b·c)
• Tx=(−c·X1+a·X2)/(a·d−b·c)
• c/a≠d/b.