Lithographic apparatus and device manufacturing method

A device manufacturing method, comprising:

• supporting a substrate on a substrate table;
• projecting a patterned beam of radiation onto the substrate using a projection system;
• supplying immersion liquid, using an immersion system, to a space between the projection system and the substrate or substrate table;
• controlling immersion liquid on at least one surface selected from the following surfaces:
• a surface of the projection system, a surface of the substrate table and a surface of the immersion system, by applying a controlled voltage between a first electrode, electrically connected to the immersion liquid to be controlled, and a second electrode, associated with the surface and electrically isolated from the immersion liquid to be controlled.

An immersion lithographic apparatus comprising:

• a substrate table configured to hold a substrate, wherein the substrate, the substrate table, or both the substrate and the substrate table, is coated with a layer of an electrically insulating material;
• a projection system configured to project a patterned beam of radiation onto the substrate;
• a barrier member configured to at least partly contain liquid in a space between the projection system and the substrate or substrate table, the barrier member configured such that there is a separation between the barrier member and the substrate or substrate table in which a meniscus, that surrounds the space, forms between the liquid and surrounding gas when the liquid is in the space, and the barrier member comprises an electrode arranged to be in electrical contact with the liquid adjacent a region of the meniscus;
• and
• a voltage controller configured to provide a controlled voltage difference between the electrode and the substrate, the substrate table, or both the substrate and the substrate table, when there is relative movement between the substrate table and the projection system in a direction that is substantially toward the region of the meniscus.

A device manufacturing method, comprising:

• supporting a substrate on a substrate table, wherein the substrate, the substrate table, or both the substrate and the substrate table, is coated with a layer of an electrically insulating material;
• projecting a patterned beam of radiation onto the substrate using a projection system;
• supplying liquid to a space between the projection system and the substrate or substrate table at least partly defined by a barrier member, wherein there is a space between the barrier member and the substrate, the substrate table, or both the substrate and the substrate table, in which a meniscus, that surrounds the space, forms between the liquid and surrounding gas and the barrier member comprises an electrode in electrical contact with the liquid adjacent a region of the meniscus;
• and
• providing a controlled voltage difference between the electrode and the substrate, the substrate table, or both the substrate and the substrate table, when there is relative movement between the substrate table and the projection system in a direction that is substantially towards the region of the meniscus.